Аннотации:
There has been developed a technique of section etching by HF solution to be used for the analysis of surface layers of sheet glass subjected to thermochemical treatment with fluorine- and chlorine-containing gaseous reagents. Factors influencing the dissolution rate of sheet glass subjected to HF solution have been revealed. We investigated the stability of the dissolution rate of sheet glass depending on the thickness of dissolved layer during one etching. The article also discusses the graphs of dissolution rate of the surface layers of sheet glass, modified by difluorochloromethane, depending on the thickness of the dissolved layer during one etching.